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Nanoimprint lithography
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Nanoimprint lithography (NIL) is a fabrication technology that offers high-throughput, ultrahigh resolution patterning at great cost savings compared to most competing next-generation radiative lithography methods. As a result of its rapid development in the past decade and its potential for sub-100 nm lithography, NIL has been listed by MIT’s Technology Review as one of ten emerging technologi...
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To celebrate the 20th anniversary of nanoimprint lithography (NIL) we present a perspective of how the technique and its prospects have evolved over the past two decades. We describe how it overcame certain fabrication challenges at the time it was first reported and look at some of the obstacles that hindered uptake in industry initially, as well as likely sectors for future successful commerc...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 2020
ISSN: 0912-0289,1882-675X
DOI: 10.2493/jjspe.86.263